Semiconductor cleaning .

Our company specializes in semiconductor wafer cleaning equipment, offering various applications such as PR-Strip, Pre/Post clean, Nitride remove, Metal Etching, and more.

Wet Station

ULTRON B300

Fifty-wafers batch-type 300mm wafer wet cleaning equipment

Features:

  • Cassetteless type
  • Internal buffer capacity: 16 FOUP
  • Compatible with various wet cleaning applications such as PR-strip, Pre/Post clean, Nitride remove, Metal Etching, etc.
  • Compact footprint
  • Watermark-free, excellent drying capability IPA drying machine
  • OHT/AGV compatible

ULTRON B200

Fifty-wafers batch-type 200mm wafer wet cleaning equipment

Features:

  • Cassetteless type
  • Compatible with various wet cleaning applications such as PR-strip, Pre/Post clean, Nitride etch, Metal Etching, etc.
  • SMIF pod compatible
  • Equipped with a back conveyor
  • Watermark-free, excellent drying capability IPA drying machine